Snow Glitter Peel-Off Mask
CLR
Preparation:
Slowly charge GOHSENOL into the water under agitation. Begin to raise the temperature to 80-90°C. After keep stirring at this temperature for 30-60 minutes until it is completely dissolved.(*Be careful to avoid rapid temperature increase, as this often causes severe foaming). Cool down to room temperature. Premix B, stir until homogeneous and add it to A. Stir until homogeneous and add C in the given order, one after another. Add D as desired with moderate stirring.Notes:
Directions for use: Apply a thin layer to dry skin and leave for about 10-15 minutes (until the mask dries and lifts at the edges). Peel off mask from one side.Disclaimer
While every effort has been made to reproduce these formulations correctly, the Publisher of this website cannot accept any liability for the information presented. All formulations are provided in good faith, but no warranty is given as to accuracy of information or results, or suitability for a particular use, nor is freedom from patent infringement to be inferred. Formulations are offered solely for consideration by the participating manufacturers. Continued use of this web site infers acceptance of this disclaimer.
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Our company was established in 1958 as SEIWA KASEI Industry CO., LTD., an organization for the development of industrial decomposition technology of waxes and high melting point esters such as Beeswax, Privet wax, and Carnauba wax, and for the production of various types of emulsifying waxes. In 1966, we launched our products, hydrolyzed...
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